Metrologieziel
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4749363
- Anmeldetag
- 25. November 2024
- Veröffentlichung
- 27. Mai 2026
- Rechtsraum
- EP
- IPC
- G03F1/44, G03F7/00
Abstract
A new metrology target configured for measuring a parameter of a patterning process comprises first and second portions. The first and second portions comprise substantially the same pattern in a first direction, the first and second portions are each periodic in a first direction, have a first pitch (p<sub>1</sub>) in the first direction and have a unit cell in the first direction comprising a set of at least two gratings. The first and second portions are generally mutually interleaved such that at least in a central portion of the metrology target, each set of at least two gratings of one of the first and second portions is positioned between two adjacent sets of at least two gratings of the other one of the first and second portions. The first and second portions have the different pattern (for example one or more cuts) in a second direction that is generally perpendicular to the first direction.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
3.336 Patente in unserer Datenbank
Vertreten von
-
ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven