Verfahren zur Modellierung von Metrologiedaten über einen Substratbereich und Zugehörige Vorrichtungen

Details

Veröffentlichungs-Nr.

EP4749367

Anmeldetag

20. November 2024

Veröffentlichung

27. Mai 2026

Rechtsraum

EP

IPC

G03F9/00, G03F7/00

Abstract

A computer implemented method for modeling metrology data comprising obtaining first layer measurement data sampled on a first layer measurement layout, fitting a first layer model to the first layer measurement data as sampled on the first layer measurement layout to obtain a first fitted first layer model, fitting the first layer model to the first layer measurement data as sampled on a second layer measurement layout to obtain a second fitted first layer model, determining a difference model as the difference of the first fitted first layer model and the second fitted first layer model; and correcting a fitted second layer model using the difference model.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande