Kalibrierung einer Vorrichtung

EP4752629 3. Juni 2026

Anmelder: ASML Netherlands B.V. 🇳🇱

Details

Veröffentlichungs-Nr.
EP4752629
Anmeldetag
28. November 2024
Veröffentlichung
3. Juni 2026
Rechtsraum
EP
IPC
G03F7/00
Offizieller Volltext

Abstract

An apparatus comprising: a diffractive optical element; a primary radiation source configured to illuminate the diffractive optical element with primary radiation; and a reference radiation source configured to illuminate the diffractive optical element with reference radiation; wherein the diffractive optical element has a first periodicity configured to diffract the primary radiation, and a second periodicity configured to diffract the reference radiation. The apparatus further comprises: a detector arranged to detect the primary radiation diffracted by the diffractive optical element and the reference radiation diffracted by the diffractive optical element; and a processor configured to determine a wavelength related parameter of the detected primary radiation based on a wavelength related parameter of the detected radiation. A method for calibrating an apparatus, such as a metrology apparatus, is also described.

Anmelder

Firma
ASML Netherlands B.V.
Land
🇳🇱 Niederlande
🇳🇱 ASML

Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.

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