Metrologieverfahren und Zugehörige Metrologievorrichtung
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4752634
- Anmeldetag
- 23. April 2026
- Veröffentlichung
- 3. Juni 2026
- Rechtsraum
- EP
- IPC
- G03F7/00
Abstract
Disclosed is a method of correcting a metrology image. The method comprises obtaining a degraded metrology image of a structure on a substrate, having been degraded due to motion-induced effects resulting from the motion of a substrate support system; obtaining a substrate stage trajectory prediction model and an image correction model; using the substrate support system trajectory prediction model to predict at least one substrate support system trajectory responsible for the degradation of the degraded metrology image; and using the image correction model to predict a corrected metrology image from the degraded metrology image and the predicted substrate support system trajectory.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven