Verfahren zur Schätzung einer Leistungsparameterverteilung auf einem Substrat mit mehreren Belichtungsfeldern und Zugehörige Vorrichtung

Details

Veröffentlichungs-Nr.

EP4752636

Anmeldetag

29. November 2024

Veröffentlichung

3. Juni 2026

Rechtsraum

EP

IPC

G03F7/20

Abstract

Disclosed is a method of estimating values of a performance parameter on a substrate: providing a plurality of first differences between measured values of the performance parameter obtained after having measured the performance parameter at multiple different locations across at least a first portion of the substrate and estimated values of the performance parameter obtained at the same respective locations using a first fitted fingerprint model for estimating a first spatial distribution of the performance parameter over the at least a first portion of the substrate; defining one or more zones within the at least a first portion of the substrate, wherein each zone comprises a first exposure field and at least part of one or more second exposure fields; and estimating the values of the performance parameter over the first exposure field of each of the one or more zones from said plurality of first differences.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande