Substratverarbeitungsverfahren und Substratverarbeitungsvorrichtung
Anmelder: SCREEN Holdings Co., Ltd. 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP4752830
- Anmeldetag
- 12. Mai 2021
- Veröffentlichung
- 3. Juni 2026
- Rechtsraum
- EP
Abstract
A substrate processing method includes: a holding step of carrying a substrate into an inside of a chamber and holding said substrate; a supply step of supplying a fluid to the substrate on the inside of the chamber; an imaging step (S12) of sequentially imaging the inside of the chamber by a camera to acquire image data; a condition setting step (S11) of specifying a monitoring target from a plurality of monitoring target candidates in the chamber and changing an image condition based on the monitoring target; and a monitoring step (S13) of performing a monitoring process on the monitoring target based on the image data having the image condition corresponding to the monitoring target.
Anmelder
- Firma
- SCREEN Holdings Co., Ltd.
- Land
- 🇯🇵 Japan
Japanischer Technologiekonzern. SCREEN Holdings stellt Fertigungsanlagen für die Halbleiterindustrie her, insbesondere Wafer-Reinigungs- und Beschichtungssysteme, sowie Druck- und Bildverarbeitungstechnik.
854 Patente in unserer Datenbank