Verfahren, Vorrichtung, Optische Vorrichtung für Geladene Teilchen und Bewertungsvorrichtung
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4752928
- Anmeldetag
- 29. November 2024
- Veröffentlichung
- 3. Juni 2026
- Rechtsraum
- EP
- IPC
- H01J37/153, H01J37/21
Abstract
The present invention provides a method of determining data representative of a focal surface of an array of charged particle beams and/or a height of a sample surface in a multi-beam charged particle-optical device, the method comprising: projecting beams onto a sample location at a first relative position; determining first individual focus values for individual beams; displacing the sample relative to the array of beams along a distance to a second relative position; determining second individual focus values for individual beams; displacing the sample relative to the array of beams along a distance to a third relative position; determining third individual focus values for individual beams in the array; and determining the data representative of the focal surface of the array of beams and/or the height of the sample surface based on the first individual focus values, the second individual focus values and the third individual focus values.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven