Bipolare Impulsstromversorgung für ein Plasmaverarbeitungssystem und Derartiges System und Verfahren

Details

Veröffentlichungs-Nr.

EP4752931

Anmeldetag

29. November 2024

Veröffentlichung

3. Juni 2026

Rechtsraum

EP

Abstract

A bipolar pulsing power supply (1) for a plasma processing system (10) with a first output (11) and a second output (12) the first output (11) configured to be connected to a first electrode (3) of a plasma processing chamber (7) and the second output (12) configured to be connected to a second electrode (4) of the plasma processing chamber (7), the bipolar pulsing power supply (1) is configured to: - deliver pulsed power with a first pulsed current flow (21) to a predominant extent in a first direction from the first output (11) to the second output (12) during a first time duration (23) and - deliver pulsed power with a second pulsed current flow (22) to a predominant extent in a second direction from the second output (12) to the first output (11) during a second time duration (24), wherein the first pulsed current flow (21) and the second pulsed current flow (22) are independently controllable for both directions in respect to at least one of: duty cycle (25), power level (26), voltage level (27), current level (28). A plasma processing system (10) and a method for of plasma processing with such a bipolar pulsing power supply (1) are also disclosed.

Anmelder

Firma

TRUMPF Huettinger Sp. Z o. o.

Land

🇵🇱 Polen