Lösung von Inversen Problemen durch Stochastische Optimale Steuerung
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4760395
- Anmeldetag
- 11. Dezember 2024
- Veröffentlichung
- 17. Juni 2026
- Rechtsraum
- EP
Abstract
A method of processing pattern data to data to generate description data is provided. The pattern data is informative about a patterned portion of a substrate, and the description data characterizes a model of the patterned portion of the substrate or of a lithographic apparatus operative to produce the patterned portion of the substrate. The method comprises i) obtaining the pattern data, ii) generating initial description data, and iii) at each of a plurality of iterations, updating the current description data by providing the current description data to an input of a trained controller module conditioned on the pattern data to generate first adjustment data to the current description data, randomly selecting second adjustment data to the current description data; and determining updated description data based on the current description data and the first and the second adjustment data.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V.