Herstellungsverfahren für Hemt-Bauelemente unter Verwendung von Oberflaechenbehanglungen

Details

Veröffentlichungs-Nr.

EP4766086

Anmeldetag

18. Dezember 2025

Veröffentlichung

24. Juni 2026

Rechtsraum

EP

Abstract

Modified fabrication processes for transistors with field plates such as gallium nitride heterostructure transistors reduce exposure of surfaces near the transistor channel to mitigate the risk of damage and performance degradation arising from exposure to sensitive surfaces and interfaces to high temperatures and etch-induced damage. Such processes include sequencing of dielectric formation and patterning that allows formation of gate and field plate electrodes after high-temperature processing steps. Passivation layers which can also function as etch stop layers for other dielectric materials enable protection of the channel region during dry etching processes followed by selective wet etching to remove the passivation layer immediately prior to gate electrode formation and other steps. Such methods can also enable surface modification processes to be performed to selectively enhance channel conductivity followed by passivation of modified surfaces to preserve enhanced conductivity during subsequent processing steps.

Anmelder

Firma

NXP USA, Inc.

Land

🇺🇸 USA