Gasversorgungssystem, Verarbeitungsvorrichtung, Gasversorgungsverfahren und Verfahren zur Herstellung eines Halbleiterbauelements

Details

Veröffentlichungs-Nr.

EP4769054

Anmeldetag

17. Dezember 2025

Veröffentlichung

1. Juli 2026

Rechtsraum

EP

IPC

G05D7/06, G05D11/13

Abstract

A technique includes a gas supply system including: a plurality of gas supply lines connected to a process chamber, wherein each of the plurality of gas supply lines includes an inlet-side valve through which a gas flows in, a storage in which the gas is accumulated through the inlet-side valve, and an outlet-side valve through which the gas flows out of the storage; and a regulator installed in at least one of the plurality of gas supply lines and is configured to be capable of regulating a flow path resistance of the gas supply line such that gas supply amounts from the plurality of gas supply lines into the process chamber are matched.

Anmelder

Firma

Kokusai Electric Corporation

Land

🇯🇵 Japan

Fachgebiete