Metrologieverfahren und Metrologievorrichtung

Details

Veröffentlichungs-Nr.

EP4772941

Anmeldetag

7. Januar 2025

Veröffentlichung

8. Juli 2026

Rechtsraum

EP

IPC

G03F7/00, G01N21/956

Abstract

Disclosed is a method of metrology comprising: illuminating a periodic structure with measurement illumination, the periodic structure comprising a pitch greater than 17 nm and detecting resultant scattered radiation comprising a plurality of diffraction orders. The measurement illumination comprises an illumination profile configured to either: substantially prevent overlap of the diffraction orders while providing a plurality of angles of incidence on the periodic structure which span a range greater than 10 degrees in at least one direction; or impose discontinuities in a measurement signal described by the scattered radiation as represented in pupil space, the discontinuities enabling the diffraction orders to be distinguished at least at respective locations in the pupil space of a plurality of illumination edges of the illumination profile.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete