Substratverarbeitungsverfahren und Substratverarbeitungsvorrichtung

Details

Veröffentlichungs-Nr.

EP4773169

Anmeldetag

4. Juli 2024

Veröffentlichung

6. März 2025

Rechtsraum

EP

IPC

H01L21/304

Abstract

A substrate processing method includes a liquid film forming step of supplying a sublimable substance-containing liquid containing a sublimable substance to a front surface of a substrate W to form a liquid film of the sublimable substance-containing liquid on the front surface of the substrate W, a solidified film forming step of changing the liquid film of the sublimable substance-containing liquid into a solidified film SF containing the sublimable substance on the front surface of the substrate W, a sublimating step of sublimating the solidified film SF to remove the solidified film SF from the front surface of the substrate W, and a humidity increasing step of increasing humidity of an atmosphere in contact with the substrate W after sublimation of the solidified film SF is started.

Anmelder

Firma

SCREEN Holdings Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete