Positionskalibrierungsvorrichtung und Halbleiterprozessvorrichtung

Details

Veröffentlichungs-Nr.

EP4773177

Anmeldetag

14. September 2024

Veröffentlichung

17. April 2025

Rechtsraum

EP

IPC

H01L21/68

Abstract

The present disclosure provides a position calibration apparatus and semiconductor process equipment. The position calibration apparatus includes a first light curtain assembly disposed within the process chamber of the semiconductor process equipment. The first light curtain assembly includes a first light curtain emitting end, a first light curtain receiving end, a second light curtain emitting end, and a second light curtain receiving end located on a first plane. The first light curtain emitting end is configured to emit a first calibration light to a workpiece within the process chamber, and the first light curtain receiving end is configured to receive the first calibration light and obtain a first projection of the workpiece on the first light curtain receiving end. The second light curtain emitting end is configured to emit a second calibration light to the workpiece, and the second light curtain receiving end is configured to receive the second calibration light and obtain a second projection of the workpiece on the second light curtain receiving end. An angle between a projection of the first calibration light and a projection of the second calibration light on the first plane is greater than 0°. A controller is configured to determine the position information of the workpiece based on the first projection and the second projection.

Anmelder

Firma

Beijing NAURA Microelectronics Equipment Co., Ltd.

Land

🇨🇳 China

Fachgebiete