Ausgleich der Gasstromverteilung einer Gasverarbeitungssäule

Details

Veröffentlichungs-Nr.

EP4775294

Anmeldetag

19. November 2025

Veröffentlichung

15. Juli 2026

Rechtsraum

EP

IPC

B01D53/04

Abstract

A system for uniformly distributing a gas flow in a processing chamber of a gas processing column having other than a centered top gas outlet is disclosed. The system may include a gas distribution plate installed within an internal volume of the processing chamber and in a path of a gas flow. The gas distribution plate can include a plurality of gas apertures that are arranged along the gas distribution plate and extend therethrough. An aperture area is defined by the plurality of gas apertures and the gas distribution plate is configured such that the aperture area increases along a first end-to-second end direction of the gas distribution plate. Locating the gas distribution plate in the internal volume of the processing chamber so that the first end of the gas distribution plate is closer to the gas outlet can cause the gas flow through the processing chamber to be uniformly distributed.

Anmelder

Firma

Technip Energies France

Land

🇫🇷 Frankreich

Fachgebiete