Schutzmembran für eine Belichtungsvorrichtung und Verfahren

Details

Veröffentlichungs-Nr.

EP4776064

Anmeldetag

13. Januar 2025

Veröffentlichung

15. Juli 2026

Rechtsraum

EP

IPC

G03F1/62, G03F7/00

Abstract

There is provided a protective membrane for an exposure apparatus for semiconductor manufacturing processes, the protective membrane comprising a boron nitride nanotube core (203) and at least one containment layer (103) configured to contain particles (213) released from the core. Also provided is a component of an exposure apparatus for semiconductor manufacturing processes comprising such a protective membrane, as well as an exposure apparatus for semiconductor manufacturing processes comprising such a protective membrane or component. Also described is a method of manufacturing a protective membrane for an exposure apparatus for semiconductor manufacturing processes as well as a method of reconditioning a boron nitride nanotube protective membrane for an exposure apparatus for semiconductor manufacturing processes. Finally, the use of such a protective membrane, component, exposure apparatus or method in a semiconductor manufacturing process or apparatus therefor is also described.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete