Verfahren zur Herstellung eines Beleuchtungsmodus, Verfahren zur Belichtung eines Substrats und Beleuchtungssystem
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4779403
- Anmeldetag
- 20. Januar 2025
- Veröffentlichung
- 22. Juli 2026
- Rechtsraum
- EP
- IPC
- G03F7/00
Abstract
A method of forming an illumination mode using an illumination system comprising an array of individually controllable reflective elements arranged to direct portions of a radiation beam to desired locations in a pupil plane. The method comprises allocating different reflective elements of the array to direct radiation to different locations in the illumination mode by: determining a desired power spectral density function of radiation directed by the array of reflective elements to the illumination mode, the desired power spectral density function including a cutoff frequency; applying different phases to frequency components of the power spectral density function; transforming the power spectral density function into a spatial domain signal that varies as a function of positions of the reflective elements; and using the spatial domain signal to allocate reflective elements that direct radiation to different locations in the illumination mode.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven