Metrologieanordnung auf der Basis eines Oberflächenemittierenden Photonischen Kristalls

Details

Veröffentlichungs-Nr.

EP4782919

Anmeldetag

12. Juni 2026

Veröffentlichung

29. Juli 2026

Rechtsraum

EP

IPC

G03F7/00

Abstract

Metrology assemblies for measuring a parameter of a substrate, the metrology assembly comprising a photonic crystal surface emitting laser PCSEL configured to output radiation and a photonic integrated circuit PIC. The PCSEL is directly attached to a back surface of the PIC. The metrology assembly is configured to direct the radiation from the PCSEL to the substrate. The PIC has at least one input coupler configured to capture at least some of the radiation after it has interacted with the substrate. A detector configured to receive at least some of the captured radiation from the PIC for measuring the parameter.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete