Metrologieverfahren und Zugehörige Metrologievorrichtung

Details

Veröffentlichungs-Nr.

EP4782920

Anmeldetag

17. Juni 2026

Veröffentlichung

29. Juli 2026

Rechtsraum

EP

IPC

G03F7/00

Abstract

Disclosed is a metrology method, comprising: obtaining metrology image data of a structure on a substrate, the metrology image data comprising images acquired at a substrate orientation using a metrology apparatus; obtaining image metadata corresponding to the metrology image data; obtaining a trained parameter of interest inference model, the trained parameter of interest inference model being operable to infer corrected parameter of interest data from images acquired at the substrate orientation and their corresponding image metadata, the corrected parameter of interest data being corrected for metrology apparatus asymmetry error; and using the trained parameter of interest inference model to infer the corrected parameter of interest data from the metrology image data and the corresponding image metadata.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete