Mikroelektromechanisches System mit einer Beschichtung und Verfahren zur Herstellung davon
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4786408
- Anmeldetag
- 31. Januar 2025
- Veröffentlichung
- 5. August 2026
- Rechtsraum
- EP
Abstract
There is provided a microelectromechanical system (MEMS) comprising two surfaces, wherein at least a portion of one of the surfaces has a coating comprising an etch resistant layer. Also described is an optical element for semiconductor manufacturing processes comprising such a system, as well as an exposure apparatus for semiconductor manufacturing processes comprising such a system or optical element. Further describes is a the use of such system, optical element or exposure apparatus, as well as a method of coating a silicon-based surface of a MEMS device with a metal silicate layer, and a method of manufacturing a MEMS device.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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Vertreten von
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven