Verfahren zur Bestimmung der Rotationsgeschwindigkeit, Substratverarbeitungsverfahren, Verfahren zur Herstellung eines Halbleiterbauelements, Programm und Substratverarbeitungsvorrichtung

Details

Veröffentlichungs-Nr.

EP4786636

Anmeldetag

23. Januar 2026

Veröffentlichung

5. August 2026

Rechtsraum

EP

Abstract

A technique of determining a rotational speed of a substrate (200), applied in a substrate processing including intermittently supplying, to the rotating substrate (200), a process gas from an outer edge of the substrate (200) toward an in-plane direction at a constant interval, a predetermined number of times K, during a predetermined duration T, includes: (a) calculating an evaluation value E corresponding to each of a plurality of candidate values N, which are candidate values for the selectable rotational speed of the substrate (200), based on: at least one selected from the group of the predetermined duration T and a supply interval I of the process gas; the predetermined number of times K; and each of the candidate values N; and (b) determining the rotational speed of the substrate (200) to be applied in the substrate processing from among the candidate values N based on the evaluation value E calculated for each candidate value N.

Anmelder

Firma

Kokusai Electric Corporation

Land

🇯🇵 Japan