Substratverarbeitungsvorrichtung
Anmelder: SCREEN Holdings Co., Ltd. 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP4788113
- Anmeldetag
- 26. Januar 2026
- Veröffentlichung
- 5. August 2026
- Rechtsraum
- EP
- IPC
- H10P72/00
Abstract
A substrate processing apparatus includes three processing casings stacked in a vertical direction. Each of the three processing casings includes, in an internal space, a spin chuck, an ejection unit, a cup that receives a coating liquid scattered from a substrate held by the spin chuck, a cup drainage flow path that is formed to extend vertically downward from the cup and that discharges the coating liquid received by the cup, a casing drainage flow path formed to extend in the vertical direction, and a connection flow path that connects a lower end of the cup drainage flow path and the casing drainage flow path. The respective casing drainage flow paths of the three processing casings are connected as the three processing casings are stacked in the vertical direction.
Anmelder
- Firma
- SCREEN Holdings Co., Ltd.
- Land
- 🇯🇵 Japan
Japanischer Technologiekonzern. SCREEN Holdings stellt Fertigungsanlagen für die Halbleiterindustrie her, insbesondere Wafer-Reinigungs- und Beschichtungssysteme, sowie Druck- und Bildverarbeitungstechnik.
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