Substratverarbeitungsvorrichtung

Details

Veröffentlichungs-Nr.

EP4788114

Anmeldetag

3. Februar 2026

Veröffentlichung

5. August 2026

Rechtsraum

EP

Abstract

A substrate processing apparatus including: a batch processing block (7) for performing a batch process; a first orientation conversion mechanism (71) capable of converting substrates having been subjected to the batch process, from a vertical orientation to a horizontal orientation; a standby bath (55) where the substrates having been converted into the horizontal orientation are kept on standby; a lifting mechanism for performing an exposing operation of bringing one of the substrates kept on standby in the standby bath (55), the one being one substrate at a time, to a space above the standby bath (55); a center robot capable of carrying the substrates in the space above the standby bath (55) to outside; and a single-wafer processing block (8) including a single-wafer processing chamber (48) where the single-wafer process is performed to the substrates in the horizontal orientation, and the center robot (CR) carries the substrates from the space above the standby bath (55) into the single-wafer processing chamber (48).

Anmelder

Firma

SCREEN Holdings Co., Ltd.

Land

🇯🇵 Japan