Integrierte Schaltungsstrukturen mit Nanobandtransistoren und Rückseitenkondensatoren
Anmelder: INTEL Corporation 🇺🇸
Details
- Veröffentlichungs-Nr.
- EP4791140
- Anmeldetag
- 18. Dezember 2025
- Veröffentlichung
- 12. August 2026
- Rechtsraum
- EP
Abstract
Disclosed herein are IC structures with nanoribbon transistors and backside capacitors, and related methods and devices. In one aspect, an IC structure includes a nanoribbon including a semiconductor material and a transistor including a channel portion and first and second source/drain (S/D) regions, wherein the channel portion includes a portion of the semiconductor material of the nanoribbon and has a front side and a back side, and the first and second S/D regions are at the opposite ends of the channel portion. The IC structure further includes a contact structure in conductive contact with the first S/D region and a capacitor in conductive contact with the second S/D region, wherein the contact structure is at the front side of the channel portion and the capacitor is at the back side of the channel portion.
Anmelder
- Firma
- INTEL Corporation
- Land
- 🇺🇸 USA
US-amerikanischer Halbleiterhersteller mit Sitz in Kalifornien. Entwickelt und produziert Prozessoren, Chipsätze sowie weitere Halbleiterkomponenten für Computer, Server und eingebettete Systeme.
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