Positionsmesssystem zur Messung einer Position Entlang eines Optischen Wegs
Anmelder: ASML Netherlands B.V. 🇳🇱
Details
- Veröffentlichungs-Nr.
- EP4796894
- Anmeldetag
- 25. August 2025
- Veröffentlichung
- 26. August 2026
- Rechtsraum
- EP
- IPC
- G01B9/02, G03F7/00
Abstract
A position measurement system is disclosed, comprising an interferometer system, a multimode optical fiber, and a processing unit. The interferometer system is configured to measure a position along an optical path, to output a position measurement signal representative of the position into the multimode optical fiber, which produces at its output a spatial intensity profile. One or more detectors detect the spatial intensity profile, each detector comprising a plurality of pixels, each pixel corresponding to a distinct spatial region of the spatial intensity profile. The processing unit analyses each distinct spatial region and performs a mathematical analysis between a plurality of distinct spatial regions to determine one or more properties related to mode dispersion of the position measurement signal. Based on the determined properties, the processing unit identifies disturbances and/or errors in the position measurement signal.
Anmelder
- Firma
- ASML Netherlands B.V.
- Land
- 🇳🇱 Niederlande
Niederländisches Unternehmen, das Lithografiesysteme und weitere Anlagen für die Halbleiterfertigung entwickelt und herstellt, zentral für die Chipindustrie.
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ASML Netherlands B.V
ASML Netherlands B.V · Veldhoven