Lithographieeinrichtungsverfahren und Lithographievorrichtung

Details

Veröffentlichungs-Nr.

EP4796996

Anmeldetag

19. Februar 2025

Veröffentlichung

26. August 2026

Rechtsraum

EP

IPC

G03F7/00, G03F9/00

Abstract

A method of determining values for a plurality of lithographic apparatus settings for a lithographic apparatus to perform a lithographic process over a plurality of exposure fields on a substrate is described. The method comprises, for each of a plurality of subsets of the plurality of exposure fields: optimizing the values for the plurality of lithographic apparatus settings over a set number of simulation runs, wherein each of the simulation runs after a first simulation run comprises performing a simulation of the lithographic process based on values for the lithographic apparatus settings determined in an immediately preceding simulation run of the number of simulation runs, the first simulation run comprising performing the simulation of the lithographic process based on initial values for the lithographic apparatus settings.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete