Belichtungsverfahren und -Vorrichtung

Details

Veröffentlichungs-Nr.

EP4796999

Anmeldetag

21. Februar 2025

Veröffentlichung

26. August 2026

Rechtsraum

EP

IPC

G03F7/00, G05B19/416

Abstract

A substrate exposure method comprising performing, using an exposure apparatus, at least two processes simultaneously. Each process involves an activation of a respective actuator of the exposure apparatus, the method comprises in a first phase: determining, for each process, if the process is time critical or non-time critical, determining an acceleration parameter for each actuator, comprising: reducing the acceleration parameter to a value lower than a respective maximum if the process is non-time critical. In a second phase an acceleration time profile for each actuator is adjusted using the determined acceleration parameter for the respective actuator; In a third phase the at least two processes are performed by the exposure apparatus, using the adjusted acceleration time profile for each actuator.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete