Substratstufensystem und Verfahren und Belichtungsvorrichtung mit dem System

Details

Veröffentlichungs-Nr.

EP4797001

Anmeldetag

21. Februar 2025

Veröffentlichung

26. August 2026

Rechtsraum

EP

IPC

G03F7/20

Abstract

The present disclosure provides a stage system for supporting a substrate having a thickness exceeding a nominal range, comprising: a base surface; a first module movably arranged on the base surface; a second module for supporting the substrate and movably arranged on the first module; a plane of interest extending planar to a top surface of the second module at a position on or above said top surface; height adjustment means for adjusting vertical positions of the first module and the second module; and a controller configured to control relative distances between the base surface, the first module, the second module, and the plane of interest, while keeping a summation of the relative distances constant.

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete