Substratverarbeitungsvorrichtung und Substratverarbeitungsverfahren

Details

Veröffentlichungs-Nr.

EP4797929

Anmeldetag

3. Februar 2026

Veröffentlichung

26. August 2026

Rechtsraum

EP

IPC

H10P72/00

Abstract

A substrate processing apparatus includes a substrate holder, a nozzle, a liquid flow path, an adjustment valve that adjusts a flow rate of the processing liquid flowing through the liquid flow path, a nozzle movement device that moves the nozzle, and a controller that controls the nozzle movement device based on a nozzle movement condition and controls an adjustment valve based on a valve condition. The nozzle movement condition includes a plurality of portion movement information pieces defining movement speeds of the nozzle when the nozzle moves through the plurality of portions of the substrate. The valve condition includes a plurality of valve control information pieces representing methods of controlling the valve when the nozzle moves through the plurality of portions of the substrate. The plurality of valve control information pieces include first valve control information, and second valve control information different from the first valve control information.

Anmelder

Firma

SCREEN Holdings Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete