Abgassystem zur Abführung von aus einer Euv-Belichtungsvorrichtung Angesaugtem Wasserstoff

Details

Veröffentlichungs-Nr.

EP4800483

Anmeldetag

18. Februar 2026

Veröffentlichung

2. September 2026

Rechtsraum

EP

IPC

G03F7/20

Abstract

An exhaust system for exhausting hydrogen discharged from an EUV exposure apparatus is provided that includes a light-source-unit hydrogen pump module having a vacuum pump unit for sucking hydrogen discharged from a light source unit of the EUV exposure apparatus, a first oxygen sensor module that measures an oxygen concentration of gas discharged from the light-source-unit hydrogen pump module, an exposure-unit hydrogen pump module having a vacuum pump unit for sucking hydrogen discharged from an exposure unit of the EUV exposure apparatus, a second oxygen sensor module that measures an oxygen concentration of gas discharged from the exposure-unit hydrogen pump module, a hydrogen treatment module for treating hydrogen gas discharged from the first and second oxygen sensor modules, a utility module for supplying cooling water and/or nitrogen gas to each module, and a control module for supplying power to each module, and controlling each module.

Anmelder

Firma

EBARA CORPORATION

Land

🇯🇵 Japan

Fachgebiete