Behandlungsvorrichtung und -Verfahren
Anmelder: C & A Corporation, Tohoku University 🇯🇵
Details
- Veröffentlichungs-Nr.
- EP4810673
- Anmeldetag
- 30. Oktober 2024
- Veröffentlichung
- 22. Mai 2025
- Rechtsraum
- EP
Abstract
A high-frequency irradiation means (101) irradiates liquid (122) contained in a container (121) with high-frequency electromagnetic waves. A supply means (102) supplies raw material to the liquid (122). A frequency measurement means (103) measures a frequency of the high-frequency electromagnetic waves irradiated by the high-frequency irradiation means (101). A control means (104) controls the supply of raw material by the supply means (102) in accordance with the rate of change of a reference value, the reference value being based on maximum and minimum amplitude values for each cycle period for the frequency measured by the frequency measurement means (103).
Anmelder
- Firmen
- C & A Corporation
Tohoku University - Land
- 🇯🇵 Japan
Staatliche Universität in Sendai, Japan, mit Forschungsschwerpunkten unter anderem in Materialwissenschaften und Werkstofftechnik.
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