Herstellung von Mikrotargets zum Testen eines Optischen Partikelsensors (ops)

Details

Veröffentlichungs-Nr.

EP4810938

Anmeldetag

25. Februar 2026

Veröffentlichung

23. September 2026

Rechtsraum

EP

Abstract

A method for fabricating microtargets for sensor calibration and testing is provided. The method includes: determining size, shape, curvature and locations for the microtargets; forming a layer of photoresist on a surface of a wafer; forming a mask having a plurality of openings with size, shape, and locations corresponding to the microtargets; heating the wafer and the layer of photoresist; exposing the layer of photoresist through the mask; removing photoresist in the layer of photoresist that was exposed outside the locations of the microtargets; and heating the wafer with a temperature and duration to solidify the microtargets.

Anmelder

Firma

Honeywell International Inc.

Land

🇺🇸 USA