Substratbehandlungsvorrichtung und Substratbehandlungsverfahren

Details

Veröffentlichungs-Nr.

EP4812001

Anmeldetag

3. Februar 2026

Veröffentlichung

23. September 2026

Rechtsraum

EP

IPC

H10P72/00, H10P72/50

Abstract

A monitoring region is set by efficient processing, and the presence or absence of an anomaly related to an operational state of a monitoring target article is monitored efficiently. A processor of a substrate treatment apparatus sets a monitoring region three-dimensionally based on three-dimensional design information pertaining to the substrate treatment apparatus, generates a normal image for each of timings during a normal operation carried out based on a recipe by two-dimensionalizing the monitoring region in a view from a placement position, and stores the normal image in a normal image storage unit before performing an actual treatment on the substrate. Further, during working in which the substrate is actually treated based on the recipe, the processor detects an anomaly on the basis of a difference between the normal image and the real image captured by the camera, which are synchronized with the operation based on the recipe.

Anmelder

Firma

SCREEN Holdings Co., Ltd.

Land

🇯🇵 Japan

Fachgebiete