Verfahren und System zur Abbildung einer Musterungsvorrichtung

Details

Veröffentlichungs-Nr.

EP4818805

Anmeldetag

31. März 2025

Veröffentlichung

7. Oktober 2026

Rechtsraum

EP

IPC

G03F7/00

Abstract

A method of imaging a patterning device(MA) in a lithographic apparatus (LA) having an illumination system (IL) which is configured to condition a radiation beam (B) to have a desired spatial intensity distribution at a pupil plane of the illumination system (IL) and to focus the radiation beam (B) in an object plane where the patterning device (MA) is located. The method comprises: determining an illumination pupil defined in the pupil plane for illuminating the patterning device (102); measuring critical dimension values and/or reflectivity values of the patterning device (104); optimizing the illumination pupil based on the measured critical dimension values and/or the measured reflectivity values (106); and illuminating the patterning device using the optimized illumination pupil (108).

Anmelder

Firma

ASML Netherlands B.V.

Land

🇳🇱 Niederlande

Fachgebiete