Rigaku Patente

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Measurement can be performed even when spaces divided by a partition film have a pressure difference therebetween, and the partition film is easily extended without causing warping and wrinkles. Provided is an X-ray fluorescence spectrometer, which includes: an irradiation chamber, an inside of which is vacuum; and a sample chamber, an inside of which has an atmospheric pressure, the X-ray fluorescence spectrometer including: a window frame holding member, which forms a part of a partition wall between the irradiation chamber and the sample chamber, and includes an opening for allowing the X-rays to pass therethrough; and a window frame member, which is configured to hold a partition film, and is to be arranged in the opening of the window frame holding member, the partition film being formed from a material that transmits the X-rays, and being a part of the partition wall. The window frame member includes: an inner film holding member having an annular shape, the inner film holding member including a peripheral wall extending from a proximal end to be arranged on the sample chamber side toward a distal end to be arranged on the irradiation chamber side, the distal end having an opening to be closed by a part of the partition film; and an outer film holding member having an annular shape, the outer film holding member being configured to be inserted from the distal end of the inner film holding member to be mounted to the proximal end of the inner film holding member so as to fix a surrounding of the part of the partition film to the inner film holding member.

To prevent an intensity of fluorescent X-rays to be detected from being reduced, to achieve high analytical accuracy and short measurement time, provided is an X-ray fluorescence spectrometer, which includes: a sample chamber in which a sample is to be arranged; and an irradiation chamber divided from the sample chamber by a partition wall, the X-ray fluorescence spectrometer including: an X-ray source arranged in the irradiation chamber, the X-ray source being configured to obliquely apply X-rays toward an opening formed in a division wall between the sample chamber and the irradiation chamber; a window frame member configured to hold a partition film which is formed from a material that transmits the X-rays and forms a part of the partition wall, the window frame member being arranged within the opening formed in the division wall; and a film supporting member having an elongated hole for allowing the X-rays to pass therethrough, the film supporting member being arranged adjacent to the irradiation chamber side of the partition film to support the partition film from the irradiation chamber side. In plan view as viewed from the sample chamber side toward the irradiation chamber side, the film supporting member is arranged so that the elongated hole is parallel to an optical axis of the X-rays.

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Measurement can be performed in a state where a sample chamber is filled with air, and a partition film and a component arranged in an irradiation chamber are prevented from being damaged. An X-ray fluorescence spectrometer includes: a sample chamber in which a sample is to be arranged; an irradiation chamber divided from the sample chamber by a partition wall partially including a partition film which transmits X-rays, the irradiation chamber having arranged therein an X-ray source configured to emit X-rays to the sample via the partition film; and an information processing device. The information processing device includes: an irradiation time acquisition unit configured to acquire an irradiation time for which the partition film is irradiated with the X-rays; and a control unit configured to perform protection control of protecting the partition film from irradiation with the X-rays based on the irradiation time acquired by the irradiation time acquisition unit.

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

A center shift amount estimating apparatus 300 for estimating a deviation between a rotation axis of the sample and a center of a detector with respect to an X-ray source in a CT device 200, comprises a region specifying unit 330 for specifying a region of interest in a reconstructed uncorrected image to avoid an area where there is an extremely different pixel value from the surrounding area, a temporary correction unit 340 for correcting an assumed center shift amount to reconstruct a temporarily corrected image with respect to the region of interest, an index analyzing unit 360 for searching an extreme value of an index representing variation of pixel values in the temporarily corrected image, and a center shift amount specifying unit 380 for specifying an actual center shift amount with respect to the extreme value.

Zusammenfassung wird geladen …

Provided is an X-ray optical device (100) configured to align X-ray beams and the X-ray optics generating the X-ray beams in an automatized way. The X-ray optical device comprises a housing (110) to be arranged in front of an X-ray source (200); an X-ray optics (120) that is movably mounted in the housing (110) and configured to receive X-rays (220) from the X-ray source (200) to generate and project a beam of X-rays (220a); and an actuating unit (130) configured to move the X-ray optics (120) within the housing (110) in at least one direction transverse to an X-ray beam propagation direction while maintaining a pre-adjusted angle of incidence between the X-ray optics (120) and the incident X-rays (220) to move the X-ray beam (220a) in the at least one direction transverse to the propagation direction. Further provided is an X-ray generator comprising an X-ray source and the X-ray optical device.

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Summary[Problem]To provide a configuration capable of further supporting measurement in electron diffraction.[Solution]According to one aspect of the present invention, a structural analysis device using electron diffraction is provided. This structural analysis device is provided with at least one processor capable of executing a program so as to perform the following steps. In a display step, an image including a plurality of samples is displayed from transmitted electronic data, wherein the transmitted electronic data is transmitted electron data obtained by irradiating a region including the plurality of samples with an electron beam. In a calculation step, transmittance of each of the plurality of samples is calculated on the basis of the transmitted electronic data. In a selection step, at least one sample satisfying a predetermined condition is selected from within the image, wherein the predetermined condition is a condition related to the transmittance.

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …

Zusammenfassung wird geladen …