Dumlich, Heiko Alexander

The invention relates to an electron imaging apparatus (23) configured to be connected to an energy analyzer apparatus. The electron imaging apparatus comprises a receiving aperture (22), a control unit, and a field generating unit (65). The receiving aperture is configured for receiving electrons from a focal volume (200) which form an electron beam (25). The control unit is configured for providing a control signal to the field generating unit based on a desired height of the electron beam in an energy dispersive direction (y) of the energy analyzer apparatus at a proximal end (90) of the electron imaging apparatus and a desired angular distribution (αp) in the energy dispersive direction at the proximal end. The field generating unit is configured for generating at least one electrostatic, magnetic, or electrostatic and magnetic field based on the at least one control signal such that the at least one electrostatic, magnetic, or electrostatic and magnetic field is configured for exerting a force on the electrons of the electron beam in the energy dispersive direction such that a height of the electron beam in the energy dispersive direction at the proximal end corresponds to the desired height in the energy dispersive direction at the proximal end and an angular distribution in the energy dispersive direction at the proximal end corresponds to the desired angular distribution in the energy dispersive direction at the proximal end.

The present invention relates to determining at least one property of a sample with a device that comprises a micromechanical sensor having an apex. A first quantity indicative of a response of the micromechanical sensor due to an apex-sample-interaction and a second quantity indicative of a response of the micromechanical sensor due to a local actuation force acting locally on or in the micromechanical sensor are obtained. At least one first calibration value for calibrating the first quantity and at least one second calibration value for calibrating the second quantity are provided. The at least one first calibration value is configured for causing a change to one or more determined positions of the apex in the response of the micromechanical sensor due to the apex-sample-interaction. The at least one second calibration value is configured for causing a change to one or more determined positions of the apex in the response of the micromechanical sensor due to the local actuation force acting locally on or in the micromechanical sensor. The at least one property of the sample is determined based on the obtained first quantity, the obtained second quantity, the provided at least one first calibration value and the provided at least one second calibration value.

The invention relates to an imaging device (100) for imaging a surface topography of a sample (116) in a fluid environment (112). The imaging device comprises a probe device (102) comprising an internal channel (106) extending through the probe device and comprising an outlet aperture (108), the probe device being configured and arranged for providing a fluid probe (110) at the outlet aperture, a micro fluidic pressure controller (114) that is configured for controlling the provision of the fluid probe at the outlet aperture of the probe device, an interaction sensor (118) that is configured for measuring an interaction value indicative of an interaction between the fluid probe provided at the outlet aperture of the probe device and a sample (116), and a surface topography determination unit (120) that is configured for determining a surface topography of the sample based on the measured interaction value.

The present invention relates to a positioning system (10') for nanoscale positioning. It comprises a support structure (12), a first translation axis (14') and a second translation axis (16'). The first translation axis extends along a first direction (x), for moving a processing object (20) along the first direction and has a first translation axis width (w1) in a second direction (y) perpendicular to the first direction. The second translation axis extends along the second direction, for moving a processing tool (30) for processing the processing object along the second direction. The first and second translation axes are arranged with a distance to each other in a third direction (z) perpendicular to the first and second directions and are connected to or part of the support structure. The positioning system is configured for moving the processing tool over the whole first translation axis width without colliding with the support structure.

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