JEOL

An electron microscope (100) includes: an electron source (10) that emits an electron beam; an electrostatic/electromagnetic field superposed objective lens (20) in which an acceleration tube (240) is built into a magnetic field lens; a correction electrode (50) placed between the acceleration tube (240) and a specimen (S); and a specimen stage (30) that tiltably supports the specimen (S), wherein a positive voltage is applied to the acceleration tube (240), a negative voltage is applied to the correction electrode (50), and a potential on an optical axis (A) between the correction electrode (50) and the specimen (S) is equal to or higher than a potential of the specimen (S).

An information processing apparatus includes: a defect candidate specifying unit (72) configured to specify a plurality of defect candidates positioned at substantially the same positions in a plurality of layers adjacent to each other in a stacking direction; a defect detection unit (73) configured to detect a defect remaining in a manufactured object based on a size of the plurality of defect candidates positioned at the substantially same positions and specified in the plurality of layers in the stacking direction and a size of each of the plurality of defect candidates in the layer, and to determine the defect as any one of a first defect which is not allowed to remain in the manufactured object and a second defect which is allowed to remain in the manufactured object based on a maximum length of the defect; and a display control unit (74) configured to create a visualized image obtained by visualizing defect information including at least one of the first defect and the second defect and to perform control such that the visualized image is displayable on a display unit (90) during powder bed fusion additive manufacturing.

There is provided a sample holder capable of restricting the positional deviation of a sample. The sample holder (100) is for use with sample milling equipment that mills the sample (2) by irradiating it with an ion beam (IB). The sample holder (100) includes a holder base (10), a sample holding portion (20) for holding the sample (2), and a positional securing portion (40) for securing the sample holding portion (20) in position. The positional securing portion (40) includes a shaft (42) connected to the sample holding portion (20), a first supportive member (44) providing rotatable support of the shaft (42), and a second supportive member (46) supporting the first supportive member (44) such that it can move along an axis perpendicular to the axis of the shaft (42). When the second supportive member (46) is rotated, the second supportive member (46) moves along the axis of the shaft (42), thus tightening together the sample holding portion (20) and the holder base (10) while rotation of the first supportive member (44) concomitant with the rotation of the second supportive member (46) is restricted.

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A first trend chart (170) and a second trend chart (172) are displayed along with a chromatogram (168). The first trend chart (170) is generated based on a plurality of first representative value arrays obtained from a plurality of mass spectra. The second trend chart (172) is generated based on a plurality of second representative value arrays obtained from the plurality of mass spectra. A mass spectrum stable period is determined based on the first trend chart (170) and the second trend chart (172).

A secondary battery (32) is fixed in a sealed container (28). A first tool unit (56) and a second tool unit (58) are provided on the sealed container (28). The first tool unit (56) is formed from a first tool (60) and a first holder (62). The second tool unit (58) is formed from a second tool (74) and a second holder (76). The first holder (62) holds the first tool (60) while maintaining airtightness of the sealed container, while allowing an advancing/retreating movement and a tilting movement of the first tool (60). The second holder (76) has a structure similar to that of the first holder (62).

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Zusammenfassung wird geladen …

A charged particle beam system includes: a chamber (202); a charged particle source unit that has a charged particle source (210); a supporting member (700) that is provided on a side wall of the chamber and detachably supports the charged particle source unit inside the chamber; and a chamber door (204) that is provided on the side wall of the chamber for access to an interior of the chamber.