SCREEN Holdings
🇯🇵 Japan aktiv
Japanischer Technologiekonzern. SCREEN Holdings stellt Fertigungsanlagen für die Halbleiterindustrie her, insbesondere Wafer-Reinigungs- und Beschichtungssysteme, sowie Druck- und Bildverarbeitungstechnik.
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Patente
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02.09.2026
Tintenstrahldruckvorrichtung mit Infrarottrocknung und Temperaturüberwachung
Werkzeug-, Fertigungs- & Drucktechnik
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Zusammenfassung
An inkjet printing apparatus (1) comprises: a transport unit (2) that transports a base material (9) in a transport direction (d1); an inkjet unit (3) that ejects inks in a plurality of colors to the base material (9) being transported by the transport unit (2); a printing controller (811) that controls the inkjet unit (3) on the basis of image data (D61) to print an objective image (61) expressed by the image data (D61) on the base material (9); a drying unit (4) located on a downstream side of the transport direction (d1) with respect to the inkjet unit (3), the drying unit applying an infrared ray to the base material (9) to dry an ink ejected to the base material (9); a temperature sensor (5) that measures a temperature at a measurement target region (AS51) in the base material (9) applied with the infrared ray; and a monitoring part (851) that monitors the temperature at the measurement target region (A51) measured by the temperature sensor (5). The measurement target region (A51) for the temperature sensor (5) is a region where infrared absorbance is greater than an average value of infrared absorbance expressed by the image data (D61). |
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02.09.2026
Regenerator für Organisches Lösungsmittel, Substratverarbeitungssystem und Verfahren zur Regenerierung eines Organischen Lösungsmittels
Verfahrens- & Trenntechnik
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Zusammenfassung
An organic solvent regenerator includes a collection tank, an exhaust pipe, an exhaust valve, a circulator, a separation pipe, and a controller. An organic solvent and water flow into the collection tank through a collection pipe. The exhaust pipe in which the exhaust valve is disposed is connected to the collection tank. The controller opens the exhaust valve during at least a part of an inflow period in which at least one of the water and the organic solvent flows into the collection tank through the collection pipe, and closes the exhaust valve during at least a part of a separation operation period in which a separation operation of causing the circulator to circulate the mixed liquid and separating the water from the mixed liquid is performed. |
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02.09.2026
Verfahren zur Regenerierung eines Organischen Lösungsmittels, Regenerator eines Organischen Lösungsmittels und Substratverarbeitungssystem
Verfahrens- & Trenntechnik
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Zusammenfassung
A method of regenerating an organic solvent includes: collecting a mixed liquid of an organic solvent and water in a collection tank, the organic solvent and the water being discharged from a substrate processing apparatus that processes a substrate; and performing a separation operation of circulating the mixed liquid through a circulation path formed by the collection tank and a circulation pipe in which a membrane separator is disposed, and reducing, using a decompression pump, a pressure in a second path partitioned by a separation membrane in the membrane separator from a first path which is inserted into the circulation pipe and through which the mixed liquid passes, the performing including controlling the decompression pump with a control set value based on a target concentration on a solvent concentration of the mixed liquid. |
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26.08.2026
Drucker und Wartungsverfahren
Werkzeug-, Fertigungs- & Drucktechnik
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Zusammenfassung
A printer (9) includes a head (21) that ejects ink, and a maintenance unit (70) that performs maintenance of the head (21). The maintenance unit (70) includes a cleaning block (72) and a wiper (730). In a maintenance process, a controller (90) performs a cleaning process of causing the cleaning block (72) to supply a cleaning liquid to a nozzle surface (712) through a supplying hole (721) and to suck in a liquid adhering to the nozzle surface (712) through a suction hole (722), and a wiping process of causing the wiper (730) to wipe off the nozzle surface (712). The controller (90) keeps the pressure in the nozzle (200) at a predetermined first pressure (P<sub>1</sub>) during printing and keeps the pressure in the nozzle (200) at a predetermined wiping pressure (Pw) during the cleaning process and the wiping process. The wiping pressure (Pw) is higher than the first pressure (P<sub>1</sub>) and lower than a second pressure (P<sub>2</sub>) under which the ink adheres to the wiper (730) during the wiping process. Accordingly, the nozzle surface is wiped off under appropriate conditions during the wiping of the ink adhering to the lower surface of the head. |
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26.08.2026
Datenverarbeitungsverfahren
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Zusammenfassung
With this data processing method, a thinning-out step and a compression step are performed on input data items (D1 to D16) to obtain compression data (C). The thinning-out step (S2) involves a peak-point extraction step (S202) of extracting only peak points in the input data items (D1 to D16). In the compression step (S3), the compression data (C) is generated by changing the data format of thinned-out data items (T1 to T16) generated across multiple channels in the thinning-out step (S2) such that the number of offset bytes for every one of all channels and a channel data item for every one of all the channels are arranged in orderly sequence. In each channel data item, the number of skipped points for every one of all data points in the channel data item and a difference in data value for every one of all the data points are arranged in orderly sequence. This thinning-out and compression of data enable reversibly and appropriately compressing the data while avoiding a loss of essential signal elements. That is, it is possible to appropriately compress digital data measured at multiple points across a plurality of channels by using a multi-electrode array device. |
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26.08.2026
Substratverarbeitungsvorrichtung und Substratverarbeitungsverfahren
Halbleiter & Elektrische Bauelemente
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Zusammenfassung
A substrate processing apparatus includes a substrate holder, a nozzle, a liquid flow path, an adjustment valve that adjusts a flow rate of the processing liquid flowing through the liquid flow path, a nozzle movement device that moves the nozzle, and a controller that controls the nozzle movement device based on a nozzle movement condition and controls an adjustment valve based on a valve condition. The nozzle movement condition includes a plurality of portion movement information pieces defining movement speeds of the nozzle when the nozzle moves through the plurality of portions of the substrate. The valve condition includes a plurality of valve control information pieces representing methods of controlling the valve when the nozzle moves through the plurality of portions of the substrate. The plurality of valve control information pieces include first valve control information, and second valve control information different from the first valve control information. |
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19.08.2026
Optische Vorrichtung, Inspektionsvorrichtung und Inspektionsverfahren
Mess-, Prüf- & Zeitmesstechnik
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Zusammenfassung
This invention is relates to an optical apparatus for inspecting an optical integrated circuit. The optical apparatus includes a light source which emits light, an illumination optical unit which is configured to shape the light emitted from the light source into a predetermined shape, a modulator which includes a spatial light modulator on which the light shaped by the illumination optical unit is incident, the modulator emitting modulated light having a predetermined pattern shape by modulating incident light by the spatial light modulator and, and a light guide which guides the modulated light to an input end of an optical waveguide provided in the optical integrated circuit. A time required for an alignment processing can be largely shortened. |
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05.08.2026
Substratverarbeitungsvorrichtung
Halbleiter & Elektrische Bauelemente
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Zusammenfassung
A substrate processing apparatus includes three processing casings stacked in a vertical direction. Each of the three processing casings includes, in an internal space, a spin chuck, an ejection unit, a cup that receives a coating liquid scattered from a substrate held by the spin chuck, a cup drainage flow path that is formed to extend vertically downward from the cup and that discharges the coating liquid received by the cup, a casing drainage flow path formed to extend in the vertical direction, and a connection flow path that connects a lower end of the cup drainage flow path and the casing drainage flow path. The respective casing drainage flow paths of the three processing casings are connected as the three processing casings are stacked in the vertical direction. |
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05.08.2026
Tintenstrahldrucker und Druckverfahren
Werkzeug-, Fertigungs- & Drucktechnik
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Zusammenfassung
A first head for ejecting first ink and a second head for ejecting second ink are arranged in order from an upstream side along a transport path for a base material. A surface-tensiondifference regulator executes regulation processing for changing a dynamic-surface-tension characteristic of at least one ink. In a case where the time when first ink droplets land on a target position of the base material is given as a first time, the time when second ink droplets land on the target position is given as a second time, and an absolute value of a difference between the dynamic surface tensions of the first ink droplets and the second ink droplets at the second time is given as a first-and-second ink surface tension difference, the first-and-second ink surface tension difference when the regulation processing is executed is smaller than that when the regulation processing is not executed. |
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05.08.2026
Substratverarbeitungsvorrichtung
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Zusammenfassung
A substrate processing apparatus including: a batch processing block (7) for performing a batch process; a first orientation conversion mechanism (71) capable of converting substrates having been subjected to the batch process, from a vertical orientation to a horizontal orientation; a standby bath (55) where the substrates having been converted into the horizontal orientation are kept on standby; a lifting mechanism for performing an exposing operation of bringing one of the substrates kept on standby in the standby bath (55), the one being one substrate at a time, to a space above the standby bath (55); a center robot capable of carrying the substrates in the space above the standby bath (55) to outside; and a single-wafer processing block (8) including a single-wafer processing chamber (48) where the single-wafer process is performed to the substrates in the horizontal orientation, and the center robot (CR) carries the substrates from the space above the standby bath (55) into the single-wafer processing chamber (48). |
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