ASML Patente

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An optical beam member for a charged particle-optical device configured to direct a charged particle beam towards a sample location, the optical beam member comprising: a charged particle beam aperture for passage of the charged particle beam, an emitter arrangement associated with the charged particle beam aperture, the emitter arrangement configured to emit an optical radiation towards the sample location, and an optical source module comprising an optical source arrangement for providing an optical radiation input to the said emitter arrangement. An assembly comprising the optical beam member. A charged particle-optical device comprising the assembly. A method for directing optical radiation towards a sample location of a sample.

An apparatus configured for determining geometric surface properties and for determining material properties of a same measuring region of a sample to be investigated, the apparatus comprising an illumination device arranged for illuminating a measuring region of the sample, an elastic camera system for determining the geometric surface properties of said sample in the measuring region by capturing light elastically scattered from the sample in the measuring region, an inelastic camera system for determining material properties of the sample in the measuring region by capturing light inelastically scattered from the sample in the measuring region and optics arranged to guide light elastically and inelastically scattered from the sample in the measuring region to the elastic camera system and the inelastic camera system, respectively.

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The invention provides a position measurement system, comprising:a light source to provide a measurement beam and a reference beam propagating along a common light beam path,an optical device located in the common light beam path and downbeam of the light source, wherein the optical device is configured to induce or adjust an offset between the measurement beam and the reference beam,interferometer optics downbeam of the optical device, the interferometer optics configured to propagate the measurement beam in multiple passes along measurement paths to a measurement surface and the reference beam in multiple passes along reference paths to a reference surface,a detector to receive a reflected measurement beam and a reflected reference beam after a final pass of the multiple passes,wherein a reflective surface in the measurement paths or the reference paths is tilted, such that an incident angle of the measurement beam or reference beam incident on the respective reflective surface is at a non-90 degrees angle and at a non-45 degrees angle with respect to the reflective surface.

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Disclosed is a substrate, associated patterning device and metrology method. The substrate comprises one or more first metrology targets for measuring a parameter of interest in one or more measurement directions, each said one or more first metrology targets comprising at least one first-type sub-target and at least one second-type sub-target; and one or more second metrology targets, wherein each said second metrology target is similar to each said first metrology target, but with the first-type sub-targets swapped in position with the second-type sub-targets of the same measurement direction for at least one measurement direction of said one or more measurement directions.

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The present disclosure provides an object stage system, comprising: a balance mass having a top surface, a bottom surface, and one or more side surfaces; at least one object table movable with respect to said top surface; at least one object table follower movable with respect to a side of the balance mass and supporting a cable slab connected to a corresponding object table; a first position measurement system for measuring a first position of the at least one object table relative to the top surface in six degrees of freedom, and a second position measurement system for measuring a second position of the object table follower relative to the balance mass in six degrees of freedom.

Disclosed is a method of determining a fiducial degradation metric for a sensor fiducial. The method comprises obtaining fiducial plane position data describing a position over a time period, and in a fiducial plane, of a plurality of marks on a fiducial surface; determining first fiducial position drift data from the fiducial plane position data, said first fiducial position drift data describing a temporal drift in measured positions within the fiducial plane position data; obtaining height data describing a position over said time period, and perpendicular to the fiducial plane, of the fiducial surface; determining second fiducial position drift data from said height data; and determining the fiducial degradation metric from said first fiducial position drift data and said second fiducial position drift data.

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A method of updating images taken by charged-particle beam (CPB) tool of a feature of a wafer. The method includes generating a distortion map by a machine learning model trained on: a first CPB image of the feature, wherein the first image has a first resolution; a second CPB image of the feature, wherein the second image has a second resolution different from the first resolution and the second CPB image includes distortions; and a mask based on the first CPB image. The distortion map indicates how the second CPB image is distorted relative to the feature. A third image of the feature is generated by applying the distortion map to the second CPB image, wherein the third image has a third resolution higher than the first resolution and is used for performing metrology or defect detection.

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An electrical connection system 300 comprising: a first body 310; a first electrical contact member 311 attached to the first body; a second body 320 movable relative to the first body; a second electrical contact member 321 attached to the second body; and a passive pneumatic actuator 322 configured to change length in a first direction in response to changes in the fluid pressure surrounding the pneumatic actuator; wherein, in a disconnected state, the pneumatic actuator has a first length whereby the first and second electrical contact members 311, 321 are not in electrical contact; wherein, in a connected state, the pneumatic actuator has a second length whereby the first and second electrical contact members 311, 321 are in electrical contact; wherein the system further comprises a first compliant member 315 through which the first electrical contact member 311 is attached to the first body 310, and the first compliant member 315 is configured to accommodate relative movements between the first and second bodies 310, 320 in a second direction different from the first direction.

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A gas cell for a broadband light source, the gas cell comprising: a hollow core photonic crystal fiber, HC-PCF; a first clamping device coupled to a first end of the HC-PCF; and a first actuator coupled to the first clamping device, the first actuator controllable to move the first clamping device towards a first transparent window of the gas cell.

An exposure apparatus configured to perform a lithographic exposure process, comprising an actuator, and a control unit configured to control the actuator, the control unit comprising a trained machine learning model. The control unit is configured to determine, within a predetermined amount of time, a control setting for controlling the actuator by: obtaining a desired correction of the lithographic exposure process; determining an initial control setting for the actuator based on the desired correction of the lithographic exposure process; and iteratively refining the initial control setting to approach the desired correction of the lithographic exposure process, thereby obtaining the control setting for the actuator. The control unit is configured to determine the initial control setting for the actuator by providing the desired correction of the lithographic exposure process as input to the trained machine learning model.

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Disclosed is a method of controlling a broadband radiation source comprising at least an optical fiber configured to receive pump radiation and generate broadband output radiation. The method comprises obtaining ambient pressure data describing an ambient pressure in an environment of the broadband radiation source; controlling at least one parameter of the pump radiation in dependence of the ambient pressure data; and generating the broadband output radiation using the pump radiation to excite the optical fiber and/or a working medium confined therein.